Intels' ultraviolet extremes EUV prototype

At Thursday's Research@Intel event in Mountain View, California, press folk sat down with Mike Mayberry to discuss the company's future chip-fabrication goals. Among them was extreme ultraviolet lithography (EUV), which will help to cost-effectively shrink chip manufacturing below 32nm. Intel is currently gearing up for its next-generation 32mn chips, but they will be built using a […]

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At Thursday's Research@Intel event in Mountain View, California, press folk sat down with Mike Mayberry to discuss the company's future chip-fabrication goals. Among them was extreme ultraviolet lithography (EUV), which will help to cost-effectively shrink chip manufacturing below 32nm. Intel is currently gearing up for its next-generation 32mn chips, but they will be built using a highly-refined version of tried-and-true immersion lithography technology - not EUV.

More infoThe Register

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